The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2025
Filed:
May. 23, 2023
Samsung Electronics Co., Ltd., Suwon-si, KR;
Injae Lee, Suwon-si, KR;
Sungyong Bae, Suwon-si, KR;
Daegeun Yoon, Suwon-si, KR;
Inho Choi, Suwon-si, KR;
Sunghyup Kim, Suwon-si, KR;
Euishin Kim, Suwon-si, KR;
Jeonggil Kim, Suwon-si, KR;
Yebin Nam, Suwon-si, KR;
Dongjin Lee, Suwon-si, KR;
Jonggu Lee, Suwon-si, KR;
Dohyun Jung, Suwon-si, KR;
Dongsik Jeong, Suwon-si, KR;
Abstract
A substrate processing apparatus includes a table in an exposure chamber that is configured to perform an exposure process on a semiconductor substrate, a guiding device including a first horizontal driving body slidably movable in a first horizontal direction and a guide rail on the first horizontal driving body and having a trench extending in a second horizontal direction, a positioning device connected to the guiding device, the positioning device including a slider, a second horizontal driving body and a substrate stage, the slider configured to slidably move in the second horizontal direction along the trench, the second horizontal driving body connected or fixed to the slider, the substrate stage on the second horizontal driving body and configured to support the semiconductor substrate, and a blocking member between the guide rail and the substrate stage to block an inflow of foreign substances onto the substrate stage.