The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2025
Filed:
Mar. 09, 2024
Applicant:
Nova Ltd., Rehovot, IL;
Inventors:
Gilad Barak, Rehovot, IL;
Yonatan Oren, Kiryat Ono, IL;
Assignee:
NOVA LTD., Rehovot, IL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J 3/44 (2006.01); G01J 3/02 (2006.01); G01J 3/06 (2006.01); G01J 3/10 (2006.01); G01J 3/28 (2006.01);
U.S. Cl.
CPC ...
G01J 3/0208 (2013.01); G01J 3/0224 (2013.01); G01J 3/06 (2013.01); G01J 3/10 (2013.01); G01J 3/2803 (2013.01); G01J 3/2823 (2013.01); G01J 3/44 (2013.01); G01J 2003/283 (2013.01);
Abstract
A polarized Raman Spectrometric system for defining parameters of a polycrystalline material, the system comprises a polarized Raman Spectrometric apparatus, a computer-controlled sample stage for positioning a sample at different locations, and a computer comprising a processor and an associated memory. The polarized Raman Spectrometric apparatus generates signal(s) from either small sized spots at multiple locations on a sample or from an elongated line-shaped points on the sample, and the processor analyzes the signal(s) to define the parameters of said polycrystalline material.