The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 13, 2025

Filed:

Feb. 28, 2022
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

En-Tian Lin, Hsinchu, TW;

Chwen Yu, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 67/00 (2006.01); B01D 69/02 (2006.01);
U.S. Cl.
CPC ...
B01D 67/003 (2013.01); B01D 67/0004 (2013.01); B01D 67/0027 (2013.01); B01D 69/02 (2013.01); B01D 2221/14 (2013.01); B01D 2323/24 (2013.01); B01D 2323/28 (2013.01); B01D 2325/021 (2013.01); B01D 2325/08 (2013.01);
Abstract

A method for making a filter membrane includes: forming a polymer layer; applying a plurality of nanoparticles on the polymer layer, the nanoparticles being self-assembled to form a closed pack arrangement on the polymer layer; heating the nanoparticles such that a portion of the polymer layer contacting the nanoparticles is softened so that the nanoparticles are sunk into the polymer layer; and removing the nanoparticles from the polymer layer so that the polymer layer is formed with a plurality of pores penetrating the polymer layer and being arranged in a honeycomb pattern.


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