The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 06, 2025

Filed:

Nov. 21, 2022
Applicant:

Hunan San'an Semiconductor Co., Ltd., Hunan, CN;

Inventors:

Boting Liu, Xiamen, CN;

Yutao Fang, Xiamen, CN;

Shuai Chen, Xiamen, CN;

Nientze Yeh, Xiamen, CN;

Fuchin Chang, Xiamen, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 62/815 (2024.12); H01L 21/02 (2005.12); H10D 30/01 (2024.12); H10D 30/47 (2024.12); H10D 62/824 (2024.12); H10D 62/85 (2024.12);
U.S. Cl.
CPC ...
H10D 62/8171 (2024.12); H01L 21/02458 (2012.12); H01L 21/02507 (2012.12); H01L 21/0254 (2012.12); H01L 21/0262 (2012.12); H10D 30/015 (2024.12); H10D 30/4738 (2024.12); H10D 62/824 (2024.12); H10D 62/8503 (2024.12);
Abstract

An epitaxial structure for a high-electron-mobility transistor includes a substrate, a nucleation layer, a buffer layered unit, a channel layer, and a barrier layer sequentially stacked on one another in such order. The buffer layered unit includes a plurality of p-i-n heterojunction stacks. Each of the p-i-n heterojunction stacks includes p-type, i-type, and n-type layers which are made of materials respectively represented by chemical formulas of AlGaN, AlGaN, and AlGaN. For each of the p-i-n heterojunction stacks, x decreases and z increases along a direction away from the nucleation layer, and y is consistent and ranges from 0 to 0.7.


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