The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 06, 2025

Filed:

Dec. 17, 2020
Applicant:

Carl Zeiss Multisem Gmbh, Oberkochen, DE;

Inventors:

Dirk Zeidler, Oberkochen, DE;

Hans Fritz, Glottertal, DE;

Ingo Mueller, Aalen, DE;

Stefan Schubert, Oberkochen, DE;

Arne Thoma, Aalen, DE;

András Major, Oberkochen, DE;

Assignee:

Carl Zeiss MultiSEM GmbH, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/317 (2005.12); H01J 37/14 (2005.12); H01J 37/147 (2005.12);
U.S. Cl.
CPC ...
H01J 37/3177 (2012.12); H01J 37/14 (2012.12); H01J 37/1471 (2012.12); H01J 2237/0453 (2012.12); H01J 2237/141 (2012.12);
Abstract

A particle beam system includes: a multi-beam particle source configured to generate a multiplicity of particle beams; an imaging optical unit configured to image an object plane in particle-optical fashion into an image plane and direct the multiplicity of particle beams on the image plane; and a field generating arrangement configured to generate electric and/or magnetic deflection fields of adjustable strength in regions close to the object plane. The particle beams are deflected in operation by the deflection fields through deflection angles that depend on the strength of the deflection fields.


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