The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 2025
Filed:
Aug. 26, 2020
Synopsys, Inc., Mountain View, CA (US);
Thomas Christopher Cecil, Menlo Park, CA (US);
Kevin Hooker, Austin, TX (US);
Marco Guajardo, Austin, TX (US);
Synopsys, Inc., Sunnyvale, CA (US);
Abstract
A system uses machine learning models, such as neural networks for generating mask design from a circuit design. The machine learning models have inputs and outputs which are localized to a small region of the circuit design. The machine learning model takes as input features describing the circuit design in the neighborhood of a location and generates an offset distance as output. The system uses the offset distance to generate features of the mask design, for example, main features or assist features corresponding to a circuit design polygon. The system may use the offset distance for target optimization by modifying the circuit design polygon to obtain a circuit design polygon that has improved manufacturability.