The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 2025
Filed:
Apr. 02, 2024
Applicant:
Camtek Ltd., Migdal Ha'emek, IL;
Inventors:
Yuval Weissler, Kibutz Ha'Zorea, IL;
Yossi Mangisto, Haifa, IL;
Assignee:
Camtek Ltd., Migdal Ha'emek, IL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/21 (2005.12); G01N 21/88 (2005.12); G01N 21/95 (2005.12);
U.S. Cl.
CPC ...
G01N 21/21 (2012.12); G01N 21/8806 (2012.12); G01N 21/9505 (2012.12); G01N 2021/8848 (2012.12); G01N 2201/068 (2012.12);
Abstract
A wafer inspection system employing reflected bright-field microscopy can be adapted with polarizing optics and a mirror to detect polarization-altering defects (such as micropipes) in semiconductor wafers. The polarization-altering defects can be located within the bulk of the semiconductor wafer and can be imaged as bright features on a darker background. The system can also be used for conventional bright-field inspection of non-polarization-altering defects such as contaminants and inclusions.