The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 06, 2025

Filed:

Feb. 27, 2023
Applicant:

Silanna Uv Technologies Pte Ltd, Singapore, SG;

Inventor:

Petar Atanackovic, Henley Beach South, AU;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 14/54 (2005.12); C23C 14/08 (2005.12); C23C 14/50 (2005.12); C30B 23/02 (2005.12); C30B 23/06 (2005.12); C30B 29/16 (2005.12); G01J 5/00 (2021.12); G01J 5/0802 (2021.12); G05D 23/19 (2005.12); H01J 37/32 (2005.12); H05B 1/02 (2005.12); H05B 3/14 (2005.12);
U.S. Cl.
CPC ...
C23C 14/541 (2012.12); C23C 14/08 (2012.12); C23C 14/50 (2012.12); C30B 23/025 (2012.12); C30B 23/063 (2012.12); C30B 29/16 (2012.12); G01J 5/0007 (2012.12); G01J 5/0802 (2021.12); G05D 23/1928 (2012.12); H01J 37/32724 (2012.12); H05B 1/0233 (2012.12); H05B 3/141 (2012.12); H05B 2203/005 (2012.12);
Abstract

Methods and systems of heating a substrate in a vacuum deposition process include a resistive heater having a resistive heating element. Radiative heat emitted from the resistive heating element has a wavelength in a mid-infrared band from 5 μm to 40 μm that corresponds to a phonon absorption band of the substrate. The substrate comprises a wide bandgap semiconducting material and has an uncoated surface and a deposition surface opposite the uncoated surface. The resistive heater and the substrate are positioned in a vacuum deposition chamber. The uncoated surface of the substrate is spaced apart from and faces the resistive heater. The uncoated surface of the substrate is directly heated by absorbing the radiative heat.


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