The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 29, 2025

Filed:

Feb. 16, 2024
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;

Inventors:

Feng-Wei Kuo, Zhudong Township, Hsinchu County, TW;

Wen-Shiang Liao, Miaoli County, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/392 (2019.12); G02B 27/00 (2005.12); G05B 19/18 (2005.12); G06F 30/39 (2019.12); G06F 30/394 (2019.12); G06F 30/398 (2019.12); G02B 6/122 (2005.12); G02B 6/124 (2005.12);
U.S. Cl.
CPC ...
G06F 30/392 (2019.12); G02B 27/0012 (2012.12); G05B 19/188 (2012.12); G06F 30/39 (2019.12); G06F 30/394 (2019.12); G06F 30/398 (2019.12); G02B 6/1228 (2012.12); G02B 6/124 (2012.12); G05B 2219/45026 (2012.12);
Abstract

A method and system for generating a physical layout for a grating coupler integrated in a photonically-enabled circuit are disclosed herein. In some embodiments, the method receives a parametrized wavelength, a parametrized first refractive index, a parametrized second refractive index, a parametrized taper length, a parametrized width, a parametrized grating length, and a parametrized incident angle of the optical beam incident onto the grating coupler and generates a physical layout for the grating coupler based on the received parametrized inputs, the generating of the physical layout is according to a predefined model, and outputs the physical layout of the grating coupler for manufacturing under a semiconductor fabrication process.


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