The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 29, 2025

Filed:

Sep. 20, 2023
Applicant:

Mks Instruments, Inc., Andover, MA (US);

Inventor:

Junhua Ding, Boxborough, MA (US);

Assignee:

MKS Instruments, Inc., Andover, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05D 7/06 (2005.12); G01F 1/86 (2005.12); F16K 7/14 (2005.12); F16K 7/16 (2005.12); F16K 31/00 (2005.12); G01F 1/34 (2005.12); G01F 1/36 (2005.12); G01F 1/42 (2005.12); G01F 1/50 (2005.12); G01F 15/00 (2005.12); G01F 15/02 (2005.12);
U.S. Cl.
CPC ...
G05D 7/0635 (2012.12); G01F 1/86 (2012.12); F16K 7/14 (2012.12); F16K 7/16 (2012.12); F16K 31/004 (2012.12); G01F 1/34 (2012.12); G01F 1/363 (2012.12); G01F 1/42 (2012.12); G01F 1/50 (2012.12); G01F 15/005 (2012.12); G01F 15/028 (2012.12);
Abstract

Mass flow controller (MFC) devices capable of self-verification and methods of providing for self-verifying mass flow control are provided. An MFC includes a chamber configured to receive a fluid, an upstream valve disposed upstream of the chamber, and a downstream control valve disposed downstream of the chamber. The MFC further includes a pressure drop element disposed downstream of the downstream control valve and first and second pressure sensors. A controller of the MFC is configured to control actuation of the downstream control valve by toggling between flow-based feedback control and pressure-based feedback control. In flow-based feedback control, a flow is monitored based on a rate of decay of pressure in the chamber as detected by the first pressure sensor upon closure of the upstream control valve. In pressure-based feedback control, a pressure upstream of the pressure drop element, as detected by the second pressure sensor, is monitored.


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