The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 29, 2025

Filed:

Feb. 14, 2024
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventor:
Assignee:

ASML NETHERLANDS B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 21/00 (2005.12); G01N 21/95 (2005.12); G01N 21/956 (2005.12); G02B 21/02 (2005.12); G02B 21/10 (2005.12); G03F 7/00 (2005.12);
U.S. Cl.
CPC ...
G02B 21/0016 (2012.12); G01N 21/9501 (2012.12); G02B 21/002 (2012.12); G02B 21/0036 (2012.12); G02B 21/02 (2012.12); G02B 21/10 (2012.12); G03F 7/70625 (2012.12); G03F 7/70633 (2012.12); G03F 7/706849 (2023.04); G03F 7/706851 (2023.04); G01N 21/95623 (2012.12);
Abstract

A dark field metrology device includes an objective lens arrangement and a zeroth order block to block zeroth order radiation. The objective lens arrangement directs illumination onto a specimen to be measured and collects scattered radiation from the specimen, the scattered radiation including zeroth order radiation and higher order diffracted radiation. The dark field metrology device is operable to perform an illumination scan to scan illumination over at least two different subsets of the maximum range of illumination angles; and simultaneously perform a detection scan which scans the zeroth order block and/or the scattered radiation with respect to each other over a corresponding subset of the maximum range of detection angles during at least part of the illumination scan.


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