The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2025
Filed:
Jan. 23, 2022
Carl Zeiss Multisem Gmbh, Oberkochen, DE;
Nicole Rauwolf, Birkhausen, DE;
Nico Kaemmer, Koenigsbronn, DE;
Michael Behnke, Eislingen, DE;
Ingo Mueller, Aalen, DE;
Dirk Zeidler, Oberkochen, DE;
Arne Thoma, Heidenheim, DE;
Christof Riedesel, Aalen, DE;
Gunther Scheunert, Muenster, DE;
Carl Zeiss MultiSEM GmbH, Oberkochen, DE;
Abstract
A multiple particle beam microscope and an associated method set a desired focal plane with an optical resolution and set a telecentric irradiation with the plurality of the primary beams. A method determines an optimal setting plane, into which an object surface is brought. Further, a system provides an improved resolution and telecentric irradiation for a large number of primary beams. Targeted selection and targeted individual influencing of individual primary beams and/or a mechanism means for influencing the plurality of primary beams in collective fashion can be implemented.