The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 21, 2025

Filed:

Dec. 22, 2021
Applicant:

Taiwan Semiconductor Manufacturing Company Ltd., Hsinchu, TW;

Inventors:

Yu-Hsin Hsu, Taichung, TW;

Hao-Ming Chang, Pingtung, TW;

Shao-Chi Wei, Hsinchu, TW;

Sheng-Chang Hsu, New Taipei, TW;

Cheng-Ming Lin, Yunlin County, TW;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/40 (2005.12); G03F 1/82 (2011.12);
U.S. Cl.
CPC ...
G03F 7/40 (2012.12); G03F 1/82 (2012.12);
Abstract

A method for cleaning is provided. The method includes: removing a pellicle frame from a top surface of a photomask by debonding an adhesive between the photomask and the pellicle frame, wherein a first portion of the adhesive is remained on the top surface of the photomask, and removing the first portion of the adhesive on the top surface of the photomask, including applying an alkaline solution to the top surface of the photomask, and performing a mechanical impact to the photomask.


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