The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 21, 2025

Filed:

Oct. 21, 2021
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Farzad Houshmand, Mountain View, CA (US);

Wayne French, San Jose, CA (US);

Anantha Subramani, San Jose, CA (US);

Kelvin Chan, San Ramon, CA (US);

Lakmal Charidu Kalutarage, San Jose, CA (US);

Mark Joseph Saly, Milpitas, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/16 (2005.12);
U.S. Cl.
CPC ...
G03F 7/167 (2012.12);
Abstract

Some embodiments include a method of depositing a photoresist onto a substrate in a processing chamber. In an embodiment, the method comprises flowing an oxidant into the processing chamber through a first path in a showerhead, and flowing an organometallic into the processing chamber through a second path in the showerhead. In an embodiment, the first path is isolated from the second path so that the oxidant and the organometallic do not mix within the showerhead. In an embodiment, the method further comprises that the oxidant and the organometallic react in the processing chamber to deposit the photoresist on the substrate.


Find Patent Forward Citations

Loading…