The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2025
Filed:
Sep. 06, 2021
Tokyo Electron Limited, Tokyo, JP;
Shinsuke Oka, Miyagi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A plasma processing apparatus includes: a substrate support on which a substrate is supported; a detector configured to detect a temperature of the substrate support; a measurement unit configured to measure, by the detector, a temperature change of the substrate support while the temperature of the substrate support is increasing after igniting plasma or while the temperature of the substrate support is decreasing after the plasma processing is completed and the plasma is extinguished, based on the temperature of the substrate support detected by the detector; and an acquisition unit configured to acquire a thermal resistance between the substrate and the substrate support based on the temperature change of the substrate support measured by the measurement unit.