The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 14, 2025

Filed:

Jun. 26, 2022
Applicant:

Resonac Corporation, Tokyo, JP;

Inventor:

Masaki Nanko, Tokyo, JP;

Assignee:

Resonac Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C10M 107/38 (2005.12); C08G 65/26 (2005.12); C10M 171/04 (2005.12); C10N 20/04 (2005.12); C10N 40/18 (2005.12);
U.S. Cl.
CPC ...
C10M 107/38 (2012.12); C08G 65/2639 (2012.12); C10M 171/04 (2012.12); C08G 2650/48 (2012.12); C10M 2213/0606 (2012.12); C10N 2020/04 (2012.12); C10N 2040/18 (2012.12);
Abstract

The present invention provides a fluorine-containing ether compound that can form a lubricating layer which has excellent wear resistance even if the thickness is thin and in which a decrease in film thickness due to spin-off is less likely to occur. The fluorine-containing ether compound is represented by the following formula. R—R—O—CH—R—CH—O—R—R(Ris a perfluoropolyether chain. Rand Rare either an alkyl group which may have a substituent or a hydrocarbon group having a double bond or triple bond. Rand Rare each a divalent linking group containing one or more heteroatoms, and have one or more polar groups, and the terminal end on the side bonded to Rand Ris a heteroatom. At least one of Rand Rcontains one or more secondary amine structures. At least one of R—R— and —R—Rcontains one or more cyano groups).


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