The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 08, 2025

Filed:

Dec. 23, 2021
Applicants:

Beijing Superstring Academy of Memory Technology, Beijing, CN;

Institute of Microelectronics, Chinese Academy of Sciences, Beijing, CN;

Inventors:

Weixing Huang, Beijing, CN;

Huilong Zhu, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10B 51/30 (2023.01); H10B 51/10 (2023.01); H10B 51/20 (2023.01);
U.S. Cl.
CPC ...
H10B 51/30 (2023.02); H10B 51/10 (2023.02); H10B 51/20 (2023.02);
Abstract

A semiconductor device, including a substrate, a first electrode layer, a functional layer, and a second electrode layer. The functional layer is located between the first electrode layer and the second electrode layer, and includes a first region and a second region having a C-shaped structure surrounding the first region. The C-shape structure opens toward a direction that is parallel with the substrate and away from the first region, that is, the C-shaped structure opens toward a distal side. The first region is made of at least germanium, and the second region includes a C-shaped ferroelectric layer and a C-shaped gate that are sequentially stacked. The C-shaped ferroelectric layer serves as a memory layer of the memory device.


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