The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 08, 2025

Filed:

Jun. 22, 2023
Applicant:

Applied Materials Israel Ltd., Rehovot, IL;

Inventor:

Ilya Blayvas, Jerusalem, IL;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/28 (2006.01); H01J 37/22 (2006.01); H01J 37/26 (2006.01); H01J 37/305 (2006.01);
U.S. Cl.
CPC ...
H01J 37/222 (2013.01); H01J 37/265 (2013.01); H01J 37/28 (2013.01); H01J 37/3056 (2013.01); H01J 2237/2555 (2013.01); H01J 2237/2561 (2013.01); H01J 2237/2807 (2013.01); H01J 2237/31749 (2013.01);
Abstract

A method of evaluating a region of interest of a sample including: positioning the sample within in a vacuum chamber of an evaluation tool that includes a scanning electron microscope (SEM) column and a focused ion beam (FIB) column; acquiring a plurality of two-dimensional images of the region of interest by alternating a sequence of delayering the region of interest with a charged particle beam from the FIB column and imaging a surface of the region of interest with the SEM column; generating an initial three-dimensional data cube representing the region of interest by stacking the plurality of two-dimensional images on top of each other in an order in which they were acquired; identifying distortions within the initial three-dimensional data cube; and creating an updated three-dimensional data cube that includes corrections for the identified distortions.


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