The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 01, 2025

Filed:

May. 07, 2020
Applicant:

Cambridge Gan Devices Limited, Cambourne, GB;

Inventors:

Florin Udrea, Cambridge, GB;

Loizos Efthymiou, Cambridge, GB;

Giorgia Longobardi, Cambridge, GB;

Martin Arnold, Cambridge, GB;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/778 (2006.01); H01L 27/02 (2006.01); H01L 27/06 (2006.01); H01L 27/07 (2006.01); H01L 27/085 (2006.01); H01L 27/088 (2006.01); H01L 27/095 (2006.01); H01L 29/20 (2006.01); H01L 29/205 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7787 (2013.01); H01L 27/027 (2013.01); H01L 27/0605 (2013.01); H01L 27/0738 (2013.01); H01L 27/085 (2013.01); H01L 27/088 (2013.01); H01L 27/095 (2013.01); H01L 29/2003 (2013.01); H01L 29/205 (2013.01); H01L 29/66462 (2013.01); H01L 29/778 (2013.01);
Abstract

An Ill-nitride semiconductor based heterojunction power device is disclosed and includes a first and second heterojunction transistors formed on a substrate. The first and second heterojunction transistors include first and second Ill-nitride semiconductor regions formed over the substrate. The first Ill-nitride semiconductor region includes a first heterojunction, a first terminal connected to the first Ill-nitride semiconductor region, a second terminal laterally spaced from the first terminal and connected to the first Ill-nitride semiconductor region, and a first gate region over the first Ill-nitride semiconductor region between the first and second terminals. The second Ill-nitride semiconductor region includes a second heterojunction, a third terminal connected to the second Ill-nitride semiconductor region, a fourth terminal laterally spaced from the third terminal and connected to the second Ill-nitride semiconductor region, first highly doped semiconductor regions of a first conductivity type formed over the second Ill-nitride semiconductor region.


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