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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12265333 B1

PDFFull Text
Date of Patent:
Apr. 01, 2025

Filed:

Sep. 23, 2021

Composition, resist underlayer film, method of forming resist underlayer film, method of producing patterned substrate, and compound

Applicant:

Jsr Corporation, Tokyo, JP;

Inventors:

Shin-ya Nakafuji, Tokyo, JP;

Tomoaki Taniguchi, Tokyo, JP;

Kazunori Takanashi, Tokyo, JP;

Assignee:

JSR CORPORATION, Tokyo, JP;

Attorney:

Element IP, PLC

Primary Examiner:

Sean M DeGuire

Assistant Examiner:

Andrew Preston Traywick

Int. Cl.
CPC ...
G03F 7/11 (2006.01); C07C 39/21 (2006.01); C07C 39/225 (2006.01); C07C 211/54 (2006.01); C07D 207/323 (2006.01); C07D 307/36 (2006.01); C08G 8/10 (2006.01); C09D 161/06 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); C07C 39/21 (2013.01); C07C 39/225 (2013.01); C07C 211/54 (2013.01); C07D 207/323 (2013.01); C07D 307/36 (2013.01); C08G 8/10 (2013.01); C09D 161/06 (2013.01); C07C 2603/18 (2017.05); C07C 2603/26 (2017.05); C07C 2603/50 (2017.05);
Abstract

The composition contains: a compound which has a group represented by formula (1); and a solvent. In the formula (1), Rand Reach independently represent a substituted or unsubstituted aryl group having 6 to 30 ring atoms or a substituted or unsubstituted heteroaryl group having 5 to 30 ring atoms; Rrepresents a hydrogen atom or a substituted or unsubstituted monovalent aliphatic hydrocarbon group having 1 to 10 carbon atoms; and * denotes a bonding site to a part other than the group represented by the following formula (1) in the compound.

Find Patent Forward Citations

Nakafuji, Shin-ya. (2025). Composition, resist underlayer film, method of forming resist underlayer film, method of producing patterned substrate, and compound (U.S. Patent No. 12265333). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12265333

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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