The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 01, 2025

Filed:

Jun. 10, 2021
Applicant:

Fujimi Incorporated, Aichi, JP;

Inventor:

Yoshihiro Izawa, Aichi, JP;

Assignee:

FUJIMI INCORPORATED, Aichi, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C09G 1/02 (2006.01); B24B 19/22 (2006.01); H05K 3/26 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); B24B 19/22 (2013.01); H05K 3/26 (2013.01);
Abstract

An object of the present invention is to provide a unit capable of improving redispersibility in a concentrated liquid of a polishing composition containing alumina as abrasive grains. There is provided a concentrated liquid of a polishing composition which includes: particulate alumina; colloidal alumina having an aspect ratio of more than 5 and 800 or less; at least one phosphorus-containing acid selected from the group consisting of phosphoric acid, phosphoric acid condensates, organic phosphoric acids, phosphonic acids, and organic phosphonic acids; and water, where a pH of the concentrated liquid of the polishing composition is 2 or more and 4.5 or less.


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Izawa, Yoshihiro. (2025). Concentrated liquid of polishing composition and polishing method using same (U.S. Patent No. 12264265). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12264265

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