The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 25, 2025

Filed:

Jul. 15, 2021
Applicant:

Nexchip Semiconductor Corporation, Anhui, CN;

Inventors:

Kuotung Yang, Anhui, CN;

Hui Liu, Anhui, CN;

Ke Yuan, Anhui, CN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70633 (2013.01); G03F 7/70683 (2013.01); H01L 22/12 (2013.01);
Abstract

The present disclosure discloses an overlay mark, an overlay marking method and an overlay measuring method. The overlay marking method includes at least: preparing a first material layer; preparing a first mark group on the first material layer, and the first mark group is a centrally symmetrical pattern; preparing a second material layer on the first material layer; preparing a second mark group corresponding to the first mark group on the second material layer, and the second mark group is a centrally symmetrical pattern; centers of symmetry of the second mark group and the first mark group are located on the same vertical line; preparing a third material layer on the second material layer; preparing a third mark group corresponding to the first mark group and the second mark group on the third material layer, and the third mark group is a centrally symmetrical pattern.


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