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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12259653 B1

PDFFull Text
Date of Patent:
Mar. 25, 2025

Filed:

Dec. 03, 2021

Radiation-sensitive resin composition, method of forming resist pattern, and compound

Applicant:

Jsr Corporation, Tokyo, JP;

Inventor:

Katsuaki Nishikori, Tokyo, JP;

Assignee:

JSR CORPORATION, Tokyo, JP;

Attorney:

Element IP, PLC

Primary Examiner:

John S Chu

Int. Cl.
CPC ...
G03F 7/039 (2006.01); C07C 51/02 (2006.01); C07C 55/10 (2006.01); C07C 55/32 (2006.01); G03F 7/004 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); G03F 7/32 (2006.01); G03F 7/38 (2006.01); G03F 7/40 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0392 (2013.01); C07C 51/02 (2013.01); C07C 55/10 (2013.01); C07C 55/32 (2013.01); G03F 7/0045 (2013.01); G03F 7/0397 (2013.01); G03F 7/2004 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01);
Abstract

A radiation-sensitive resin composition contains: a polymer that includes a structural unit including an acid-labile group; a radiation-sensitive acid generator; and a compound represented by the following formula (1). In the following formula (1), Rrepresents a hydrogen atom or a monovalent organic group having 1 to 30 carbon atoms; and Xrepresents a radiation-sensitive onium cation having a valency of n, wherein n is an integer of 1 to 3. It is preferable that Rin the following formula (1) represents an organic group, and that the organic group has a ring structure. It is preferable that Rin the following formula (1) represents an organic group, and that the organic group is an acid-labile group. Xin the following formula (1) preferably represents a sulfonium cation, an iodonium cation, or a combination thereof.

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