The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2025
Filed:
Oct. 06, 2023
Fujimi Incorporated, Aichi, JP;
Jingzhi Chen, Taiwan, CN;
FUJIMI INCORPORATED, Aichi, JP;
Abstract
Provided are a polishing composition, a polishing method, and a method for manufacturing a substrate. The polishing composition contains polishing abrasive grains, an additive molecule, a pH adjusting agent, and a dispersing medium. The polishing abrasive grains contain silica particles, and the silanol group density on the surface of the silica particles is 0 to 3.0 groups/nm. The silanol group density is calculated and determined based on the specific surface area measured by the BET method and the amount of silanol groups measured by titration. The pH adjusting agent is used to adjust the pH of the polishing composition to a range of 1.5 or more and 4.5 or less. The additive molecule has a structure represented by Formula (I). (In Formula (I), R, R, n, m, p, q, and r are as defined in the specification.)