The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 18, 2025

Filed:

Apr. 04, 2022
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Shinichi Hayashi, Koshi, JP;

Hiroaki Inadomi, Koshi, JP;

Shota Umezaki, Koshi, JP;

Suguru Enokida, Koshi, JP;

Kouji Kimoto, Koshi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); B08B 3/08 (2006.01); B08B 13/00 (2006.01); H01L 21/02 (2006.01); H01L 21/677 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67034 (2013.01); B08B 3/08 (2013.01); B08B 13/00 (2013.01); H01L 21/02057 (2013.01); H01L 21/67754 (2013.01);
Abstract

A substrate processing apparatus includes multiple first substrate processing devices, one or more second substrate processing devices and a transfer unit. Each of the multiple first substrate processing devices is configured to process a substrate one by one. The one or more second substrate processing devices are configured to simultaneously process multiple substrates, which are processed in the multiple first substrate processing devices. The transfer unit is configured to simultaneously carry the multiple substrates, which are processed in the multiple first substrate processing devices, into a same second substrate processing device.


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