The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2025
Filed:
Aug. 15, 2020
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Thomas Jarik Huisman, Eindhoven, NL;
Shakeeb Bin Hasan, Montreal, CA;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/28 (2006.01); G06T 5/70 (2024.01); H01J 37/22 (2006.01);
U.S. Cl.
CPC ...
H01J 37/222 (2013.01); G06T 5/70 (2024.01); H01J 37/28 (2013.01); G06T 2207/10061 (2013.01); G06T 2207/30148 (2013.01); H01J 2237/24578 (2013.01);
Abstract
Systems and methods for image enhancement are disclosed. A method for enhancing an image may include acquiring a scanning electron microscopy (SEM) image. The method may also include simulating diffused charge associated with a position of the SEM image. The method may further include providing an enhanced SEM image based on the SEM image and the diffused charge.
Huisman, Thomas. (2025). Numerically compensating sem-induced charging using diffusion-based model (U.S. Patent No. 12255042). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12255042
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile