The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2025
Filed:
Feb. 23, 2022
Applicant:
Applied Materials Israel Ltd., Rehovot, IL;
Inventor:
Lior Akerman, Rehovot, IL;
Assignee:
Applied Materials Israel Ltd., Rehovot, IL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 5/70 (2024.01); G06T 5/50 (2006.01);
U.S. Cl.
CPC ...
G06T 5/70 (2024.01); G06T 5/50 (2013.01); G06T 2207/10061 (2013.01); G06T 2207/20224 (2013.01);
Abstract
A method for improving a quality of a secondary electron image of a region of a sample, the method may include obtaining a backscattered electron (BSE) image of the region and a secondary electron (SE) image of the region; wherein the BSE image and the SE image are generated by scanning of the region with an electron beam; processing the BSE image and the SE image to provide a processed BSE image and a processed SE image; and generating a BSE compensated SE image, wherein the generating comprises applying one or more selected BSE correction factors on one or more parts of the processed BSE image.