The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2025
Filed:
Apr. 19, 2021
Asml Netherlands B.v., Veldhoven, NL;
Andrey Valerievich Rogachevskiy, Den Bosch, NL;
Bastiaan Andreas Wilhelmus Hubertus Knarren, Nederweert-Eind, NL;
Doru Cristian Torumba, Veldhoven, NL;
Arjan Gijsbertsen, Vught, NL;
Cristina Caresio, Eindhoven, NL;
Raymund Centeno, Nijmegen, NL;
Tabitha Wangari Kinyanjui, Heumen, NL;
Jan Arie Den Boer, Strijen, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
The present invention provides a method for calculating a corrected substrate height map of a first substrate using a height level sensor. The method comprises: sampling the first substrate by means of the height level sensor with the first substrate moving with a first velocity, wherein the first velocity is a first at least partially non-constant velocity of the first substrate with respect to the height level sensor, to generate a first height level data, generating a first height map based on the first height level data, and calculating a corrected substrate height map by subtracting a correction map from the first height map, wherein the correction map is calculated from the difference between a first velocity height map and a second velocity height map.