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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12252632 B1

PDFFull Text
Date of Patent:
Mar. 18, 2025

Filed:

Jun. 11, 2020

Chemical-mechanical polishing composition, rinse composition, chemical- mechanical polishing method, and rinsing method

Applicant:

Cmc Materials Kk, Aurora, IL (US);

Inventors:

Hiroshi Kitamura, Tsu, JP;

Tsuyoshi Masuda, Tsu, JP;

Yoshiyuki Matsumura, Nara, JP;

Akihisa Namiki, Tsu, JP;

Takeshi Saito, Tsu, JP;

Assignee:

ENTEGRIS, INC., Billerica, MA (US);

Attorneys:

Thomas Omholt

THOMAS OMHOLT

BRIAN SZYMANSKI

CATHERINE D GATES

ERIKA SINGLETON

COLIN C DURHAM

NIDHI KISSOON

ERIC NIELSON

SAMUEL E BLIESNER

SOMMER A SKEPS

Primary Examiner:

Roberts P Culbert

Int. Cl.
CPC ...
C09G 1/02 (2006.01); C11D 1/62 (2006.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); C11D 1/62 (2013.01); H01L 21/30625 (2013.01);
Abstract

Provided is a chemical-mechanical polishing composition comprising an abrasive, a basic component, at least one compound selected from the group consisting of a quaternary polyammonium salt, a quaternary ammonium salt having 6 or more carbon atoms, and an alkylated polymer having an amide structure, and an aqueous carrier; a rinse composition comprising the at least one compound and an aqueous carrier, as well as a method of chemically-mechanically polishing a substrate, and a method of rinsing a substrate, in which the respective compositions are used.

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Kitamura, Hiroshi. (2025). Chemical-mechanical polishing composition, rinse composition, chemical- mechanical polishing method, and rinsing method (U.S. Patent No. 12252632). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12252632

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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