The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 11, 2025

Filed:

May. 16, 2024
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventor:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/786 (2006.01); H01L 27/12 (2006.01); H01L 29/06 (2006.01); H01L 29/41 (2006.01); H01L 29/423 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01); H10B 61/00 (2023.01); H10B 63/00 (2023.01);
U.S. Cl.
CPC ...
H01L 29/78696 (2013.01); H01L 27/1207 (2013.01); H01L 29/0665 (2013.01); H01L 29/413 (2013.01); H01L 29/42392 (2013.01); H01L 29/66969 (2013.01); H01L 29/7853 (2013.01); H10B 61/22 (2023.02); H10B 63/30 (2023.02); H01L 29/7869 (2013.01);
Abstract

A transistor includes a first gate structure, a channel layer, and source/drain contacts. The first gate structure includes metallic nanosheets. Each of the metallic nanosheets includes a top surface, a bottom surface opposite to the top surface, and sidewalls connecting the top surface and the bottom surface. The channel layer surrounds the top surfaces, the bottom surfaces, and the sidewalls of the metallic nanosheets. The source/drain contacts are electrically connected to the channel layer. A portion of the channel layer is located between the source/drain contacts and the metallic nanosheets.


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