The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 11, 2025

Filed:

Jul. 25, 2023
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Hsien-Wei Chen, Hsinchu, TW;

Ying-Ju Chen, Tuku Township, TW;

Ming-Fa Chen, Taichung, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/00 (2006.01); H01L 21/74 (2006.01); H01L 21/78 (2006.01); H01L 23/31 (2006.01); H01L 23/525 (2006.01); H01L 23/544 (2006.01); H01L 23/58 (2006.01);
U.S. Cl.
CPC ...
H01L 23/544 (2013.01); H01L 21/74 (2013.01); H01L 21/78 (2013.01); H01L 23/3171 (2013.01); H01L 23/525 (2013.01); H01L 23/562 (2013.01); H01L 23/585 (2013.01);
Abstract

A method of forming a semiconductor device includes: forming first electrical components in a substrate in a first device region of the semiconductor device; forming a first interconnect structure over and electrically coupled to the first electrical components; forming a first passivation layer over the first interconnect structure, the first passivation layer extending from the first device region to a scribe line region adjacent to the first device region; after forming the first passivation layer, removing the first passivation layer from the scribe line region while keeping a remaining portion of the first passivation layer in the first device region; and dicing along the scribe line region after removing the first passivation layer.


Find Patent Forward Citations

Loading…