The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 11, 2025

Filed:

Dec. 09, 2021
Applicant:

Carl Zeiss Multisem Gmbh, Oberkochen, DE;

Inventors:

Hans Fritz, Grabs, CH;

András G. Major, Oberkochen, DE;

Dirk Zeidler, Oberkochen, DE;

Arne Thoma, Heidenheim, DE;

Joerg Jacobi, Herbrechtingen, DE;

Assignee:

Carl Zeiss MultiSEM GmbH, Oberkochen, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/147 (2006.01); H01J 37/09 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/1475 (2013.01); H01J 37/09 (2013.01); H01J 37/28 (2013.01); H01J 2237/0453 (2013.01); H01J 2237/152 (2013.01);
Abstract

A particle beam system includes a multi-beam particle source and a magnetic multi-deflector array. The magnetic multi-deflector array includes a coil that is arranged such that, during use of the particle beam system, a multiplicity of individual particle beams substantially passes through the first coil so that they are deflected in an azimuthal direction to correct an azimuthal telecentricity error of the particle beam system so that the individual particle beams telecentrically impinge on an object plane of the particle beam system.


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