The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 11, 2025
Filed:
Sep. 25, 2018
Applicant:
Resonac Corporation, Tokyo, JP;
Inventors:
Tomohiro Iwano, Tokyo, JP;
Takaaki Matsumoto, Tokyo, JP;
Tomomi Kukita, Tokyo, JP;
Tomoyasu Hasegawa, Tokyo, JP;
Assignee:
Resonac Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/02 (2006.01); C01F 17/235 (2020.01); C09K 3/14 (2006.01); H01L 21/304 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); C01F 17/235 (2020.01); C09K 3/1409 (2013.01); C09K 3/1454 (2013.01); H01L 21/304 (2013.01); C01P 2004/62 (2013.01);
Abstract
A slurry for polishing a carbon-containing silicon oxide, the slurry containing abrasive grains and a liquid medium, in which the abrasive grains include first particles and second particles in contact with the first particles, a particle size of the second particles is smaller than a particle size of the first particles, the first particles contain cerium oxide, and the second particles contain a cerium compound.