The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2025
Filed:
Feb. 01, 2022
Sandisk Technologies Llc, Addison, TX (US);
Monica Titus, Santa Clara, CA (US);
Roshan Jayakhar Tirukkonda, Milpitas, CA (US);
Senaka Kanakamedala, San Jose, CA (US);
Raghuveer S. Makala, Campbell, CA (US);
Sandisk Technologies, Inc., Milpitas, CA (US);
Abstract
A method includes forming an alternating stack of first and second layers, forming a composite hard mask layer over the alternating stack, forming openings in the hard mask, and forming via openings through the alternating stack by performing an anisotropic etch process that transfers a pattern of the openings in the composite hard mask layer through the alternating stack. The compositing hard mask includes a first cladding material layer which has higher etch resistance than upper and lower patterning films of the composite hard mask.