The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 04, 2025

Filed:

Mar. 23, 2022
Applicant:

Alpha and Omega Semiconductor International Lp, Toronto, CA;

Inventors:

Lin Lv, Shanghai, CN;

Shuhua Zhou, Shanghai, CN;

Long-Ching Wang, Cupertino, CA (US);

Jun Lu, San Jose, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/482 (2006.01); H01L 23/29 (2006.01); H01L 23/00 (2006.01); H01L 27/088 (2006.01);
U.S. Cl.
CPC ...
H01L 23/4827 (2013.01); H01L 23/295 (2013.01); H01L 24/05 (2013.01); H01L 27/088 (2013.01); H01L 2224/05644 (2013.01); H01L 2224/05655 (2013.01); H01L 2924/10253 (2013.01);
Abstract

A semiconductor device comprises a semiconductor substrate, a plurality of metal layers, an adhesive layer, a compound layer, and a plurality of contact pads. A thickness of the semiconductor substrate is in a range from 15 μm to 35 μm. A thickness of the compound layer is larger than the thickness of the semiconductor substrate. A coefficient of thermal expansion of the compound layer is less than or equal to 9 ppm/° C. A glass transition temperature of the compound layer is larger than 150° C. The plurality of metal layers comprises a first titanium layer, a first nickel layer, a silver layer, a second nickel layer, and a metallic layer. In a first example, the metallic layer is a second titanium layer. In a second example, the metallic layer is a Titanium Nitride (TiN) layer.


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