The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 04, 2025

Filed:

Aug. 26, 2022
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Laura Del Tin, The Hague, NL;

Almut Johanna Stegemann, Wateringen, NL;

German Aksenov, Delft, NL;

Diego Martinez Negrete Gasque, Delft, NL;

Pieter Lucas Brandt, Son, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/317 (2006.01); H01J 37/09 (2006.01); H01J 37/12 (2006.01); H01J 37/20 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3177 (2013.01); H01J 37/09 (2013.01); H01J 37/12 (2013.01); H01J 37/20 (2013.01); H01J 37/28 (2013.01); H01J 2237/1205 (2013.01); H01J 2237/2817 (2013.01);
Abstract

Disclosed herein is an multi-array lens configured in use to focus a plurality of beamlets of charged particles along a multi-beam path, wherein each lens in the array comprises: an entrance electrode; a focusing electrode and a support. The focusing electrode is down beam of the entrance electrode along a beamlet path and is configured to be at a potential different from the entrance electrode. The support is configured to support the focusing electrode relative to the entrance electrode. The focusing electrode and support are configured so that in operation the lens generates a rotationally symmetrical field around the beamlet path.


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