The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 25, 2025

Filed:

Oct. 20, 2020
Applicant:

Asml Holding N.v., Veldhoven, NL;

Inventor:

Daniel Paul Rodak, Milford, CT (US);

Assignee:

ASML HOLDING N.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); B08B 1/14 (2024.01); B08B 7/00 (2006.01); B08B 13/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70925 (2013.01); B08B 1/143 (2024.01); B08B 7/0028 (2013.01); B08B 13/00 (2013.01); G03F 7/70733 (2013.01); G03F 7/70808 (2013.01);
Abstract

A cleaning tool configured to be inserted into a lithography apparatus in a first configuration, configured to be engaged by a handler of the lithography apparatus, and used for cleaning a portion of the lithography apparatus. The cleaning tool is configured to move from the first configuration to a second, expanded configuration, after engagement by the handler such that the cleaning tool is in the second configuration when used for cleaning the portion of the lithography apparatus. There may also be a container configured to hold the cleaning tool in the first configuration and fit into the lithography apparatus. In that case, the cleaning tool is configured to be inserted into the lithography apparatus in the container, moved from the container by the handler for the cleaning, and returned to the container by the handler after the cleaning.


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