The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 25, 2025

Filed:

Mar. 25, 2022
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Ian Colgan, Meath, IE;

Ioan Domsa, Dublin, IE;

George Eyres, Dublin, IE;

Bartlomiej Burkowicz, Dublin, IE;

Barry Clarke, Dublin, IE;

David Hurley, Dublin, IE;

Einstein Noel Abarra, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); F27B 17/00 (2006.01); F27D 3/00 (2006.01); H01L 21/324 (2006.01); F27D 7/06 (2006.01);
U.S. Cl.
CPC ...
F27B 17/0025 (2013.01); F27D 3/0084 (2013.01); H01L 21/324 (2013.01); F27D 2007/066 (2013.01);
Abstract

The disclosure describes equipment for magnetic annealing of a substrate, the equipment including: an anneal chamber configured to heat and cool a substrate held at a soak location along a first direction in the anneal chamber, the anneal chamber including: a heater, a cooler, and a substrate lifter including a substrate holder, where the substrate holder is configured to support a substrate oriented such that the first direction is perpendicular to a major surface of the substrate; and a magnet assembly configured to establish a homogeneous zone in the anneal chamber, the soak location being within the homogeneous zone, the homogeneous zone including a region of magnetic field.


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