The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 25, 2025

Filed:

May. 05, 2023
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Sarah Michelle Bobek, Sunnyvale, CA (US);

Abdul Aziz Khaja, San Jose, CA (US);

Ratsamee Limdulpaiboon, San Jose, CA (US);

Kwangduk Douglas Lee, Redwood City, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/40 (2006.01); C23C 16/32 (2006.01); C23C 16/44 (2006.01); H01L 21/033 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4404 (2013.01); C23C 16/325 (2013.01); H01L 21/0337 (2013.01);
Abstract

Methods for in situ seasoning of process chamber components, such as electrodes are described. In an embodiment, the method includes depositing a silicon oxide film over the process chamber component and converting the silicon oxide film to a silicon-carbon-containing film. The silicon-carbon-containing film forms a protective film over the process chamber components and is resistant to plasma processing and/or dry etch cleaning. The coatings has high density, good emissivity control, and reduces risk of device property drift.


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