The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 18, 2025

Filed:

Jul. 26, 2021
Applicant:

Applied Materials Israel Ltd., Rehovot, IL;

Inventor:

Yehuda Zur, Tel-Aviv, IL;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/317 (2006.01); C23C 16/16 (2006.01); C23C 16/48 (2006.01); H01J 37/147 (2006.01); H01J 37/20 (2006.01); H01J 37/28 (2006.01); H01L 21/285 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3178 (2013.01); C23C 16/16 (2013.01); C23C 16/486 (2013.01); H01J 37/1474 (2013.01); H01J 37/20 (2013.01); H01J 37/28 (2013.01); H01L 21/28568 (2013.01); H01J 2237/002 (2013.01); H01J 2237/20285 (2013.01); H01J 2237/31732 (2013.01);
Abstract

A method of depositing material over a sample in a deposition region of the sample with a charged particle beam column, the method comprising: positioning a sample within a vacuum chamber such that the deposition region is under a field of view of the charged particle beam column; cooling the deposition region by contacting the sample with a cyro-nanomanipulator tool in an area adjacent to the deposition region; injecting a deposition precursor gas into the vacuum chamber at a location adjacent to the deposition region; generating a charged particle beam with a charged particle beam column and focusing the charged particle beam on the sample; and scanning the focused electron beam across the localized region of the sample to activate molecules of the deposition gas that have adhered to the sample surface in the deposition region and deposit material on the sample within the deposition region.


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