The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 18, 2025

Filed:

Feb. 17, 2021
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Masahide Tadokoro, Kumamoto, JP;

Masashi Enomoto, Kumamoto, JP;

Toyohisa Tsuruda, Kumamoto, JP;

Hiroshi Nakamura, Kumamoto, JP;

Kazuhiro Shiba, Kumamoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/06 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
G01B 11/0616 (2013.01); H01L 21/6715 (2013.01); H01L 21/67253 (2013.01);
Abstract

An information processing apparatus includes a prediction unit configured to calculate, based on a film thickness model representing a relationship between a state of a substrate processing apparatus and a film thickness of a coating film formed on a front surface of a substrate by the substrate processing apparatus and pre-data representing the state of the substrate processing apparatus before the substrate is processed by the substrate processing apparatus, a predicted film thickness when the substrate is processed by the substrate processing apparatus; and an output unit configured to output, based on the predicted film thickness, instruction information on a processing of the substrate before the substrate is processed by the substrate processing apparatus.


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