The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 18, 2025

Filed:

Jan. 12, 2023
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Takuya Kawaguchi, Yamanashi, JP;

Takanobu Hotta, Yamanashi, JP;

Hideaki Yamasaki, Yamanashi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/02 (2006.01); C23C 16/08 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45553 (2013.01); C23C 16/0209 (2013.01); C23C 16/08 (2013.01); C23C 16/45559 (2013.01);
Abstract

There is provided a film forming method for forming a tungsten film, comprising: preparing a substrate; and forming a tungsten film on the substrate. A chlorine-containing tungsten film whose film stress is adjusted by chlorine concentration in the film is formed as at least a part of the tungsten film.


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