The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 18, 2025

Filed:

Sep. 14, 2021
Applicant:

Ebara Corporation, Tokyo, JP;

Inventors:

Hiroyuki Shinozaki, Tokyo, JP;

Junki Asai, Tokyo, JP;

Yoshitaka Mukaiyama, Tokyo, JP;

Assignee:

EBARA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B33Y 30/00 (2015.01); B22F 10/28 (2021.01); B22F 10/322 (2021.01); B22F 12/00 (2021.01); B22F 12/70 (2021.01);
U.S. Cl.
CPC ...
B22F 12/38 (2021.01); B22F 10/28 (2021.01); B22F 10/322 (2021.01); B22F 12/70 (2021.01); B33Y 30/00 (2014.12);
Abstract

The present invention constructs, in an AM system, such an environment that fine particles are prevented from scattering from an area where the fine particles such as a powder material can be present to another area. According to one aspect, an AM system configured to manufacture a fabrication object is provided. This AM system includes a fabrication chamber in which an AM apparatus is disposed, and a buffer chamber in communication with the fabrication chamber. The buffer chamber includes an entrance in communication with a surrounding environment, an exit in communication with the fabrication chamber, a grating floor, and an exhaust port. The AM system further includes a first gate configured to be able to open and close the entrance of the buffer chamber, and a second gate configured to be able to open and close the exit of the buffer chamber.


Find Patent Forward Citations

Loading…