The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 11, 2025

Filed:

Sep. 30, 2022
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Eojin Lee, Suwon-si, KR;

Daeyoung Moon, Yongin-si, KR;

Hoyoung Tang, Seoul, KR;

Taehyung Kim, Yongin-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11C 11/412 (2006.01); G11C 8/16 (2006.01); G11C 11/419 (2006.01); H10B 10/00 (2023.01);
U.S. Cl.
CPC ...
H10B 10/12 (2023.02); G11C 8/16 (2013.01); G11C 11/412 (2013.01); G11C 11/419 (2013.01);
Abstract

A dual-port static random access memory (SRAM) cell is provided. The dual-port SRAM cell includes: P-type active patterns that are spaced apart from one another along a first direction, each of the P-type active patterns extending in a second direction perpendicular to the first direction and including at least one transistor. The P-type active patterns include first through sixth P-type active patterns which are sequentially arranged along the first direction. A first cutting area is provided between the second P-type active pattern and a first boundary of the dual-port SRAM cell that extends along the first direction, and a second cutting area is provided between the fifth P-type active pattern and a second boundary that is opposite to the first boundary and extends along the first direction.


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