The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 2025
Filed:
May. 19, 2022
Applied Materials Israel Ltd., Rehovot, IL;
Boaz Dudovich, Rehovot, IL;
Assaf Ariel, Rehovot, IL;
Amir Bar, Rehovot, IL;
Lior Yehieli, Rehovot, IL;
Chen Itzikowitz, Rehovot, IL;
Shiran Ben Israel, Rehovot, IL;
Lior Katz, Jerusalem, IL;
Eli Oren Joni, Rehovot, IL;
Eyal Rot, Rehovot, IL;
Applied Materials Israel Ltd., Rehovot, IL;
Abstract
There is provided a system and method of defect detection of a semiconductor specimen. The method includes obtaining a first image of the specimen acquired at a first bit depth, converting by a first processor the first image to a second image with a second bit depth lower than the first bit depth, transmitting the second image to a second processor configured to perform first defect detection on the second image using a first defect detection algorithm to obtain a first set of defect candidates, and sending locations of the first set of defect candidates to the first processor, extracting, from the first image, a set of image patches corresponding to the first set of defect candidates based on the locations, and performing second defect detection on the set of image patches using a second defect detection algorithm to obtain a second set of defect candidates.