The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 2025
Filed:
Nov. 17, 2020
Hard-mask forming composition, method for manufacturing electronic component, and compound and resin
Tokyo Ohka Kogyo Co., Ltd., Kawasaki, JP;
Keiichi Ibata, Kawasaki, JP;
TOKYO OHKA KOGYO CO., LTD., Kawasaki, JP;
Abstract
A hard-mask forming composition that forms a hard mask that is used in lithography, the hard-mask forming composition including at least one of a compound represented by General Formula (sc-1) and a resin having a partial structure represented by General Formula (sc-p1). In the general formula, Rand Rare organic groups having 1 to 40 carbon atoms or hydrogen atoms; Rand Rare aromatic hydrocarbon groups having 6 to 30 carbon atoms which may have a substituent; Rand Rmay be bonded to each other to form a structure having an aromatic heterocyclic ring, and the hydrogen atom of the phenylene group in the formula may be substituted with a substituent