The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 04, 2025

Filed:

Jan. 24, 2022
Applicant:

Changxin Memory Technologies, Inc., Hefei, CN;

Inventors:

Cheng Chen, Hefei, CN;

Hai-Han Hung, Hefei, CN;

Chun-Chieh Huang, Hefei, CN;

Xiaoling Wang, Hefei, CN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H10B 12/00 (2023.01);
U.S. Cl.
CPC ...
H10B 12/485 (2023.02); H10B 12/053 (2023.02); H10B 12/34 (2023.02);
Abstract

The present disclosure provides a method of manufacturing a semiconductor structure and a semiconductor structure. The method includes: providing a base and forming, on the base, a bit line contact region provided with a first groove; forming a first bit line contact layer in the first groove, wherein the first bit line contact layer in the first groove defines a second groove; forming a diffusion layer in the second groove, wherein the diffusion layer in the second groove defines a third groove; forming, in the third groove, a second bit line contact layer provided with a gap; and processing the diffusion layer.


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