The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 2025
Filed:
May. 28, 2021
Omron Corporation, Kyoto, JP;
Masashi Kurita, Kyoto, JP;
Sakon Yamamoto, Kyoto, JP;
Yuki Hasegawa, Kyoto, JP;
Yuki Hanzawa, Kyoto, JP;
Shigenori Nagae, Kyoto, JP;
Yutaka Kato, Kyoto, JP;
OMRON CORPORATION, Kyoto, JP;
Abstract
An inspection apparatus according to one or more embodiments extracts an attention area from a target image using a first estimation model, performs a computational process with a second estimation model using the extracted attention area, and determines whether a target product has a defect based on a computational result from the second estimation model. The first estimation model is generated based on multiple first training images of defect-free products in a target environment. The second estimation model is generated based on multiple second training images of defects. The computational process with the second estimation model includes generating multiple feature maps with different dimensions by projecting the target image into different spaces with lower dimensions. The extracted attention area is integrated into at least one of the multiple feature maps in the computational process with the second estimation model.