The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 04, 2025

Filed:

Oct. 19, 2022
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Seung Woo Lee, Seoul, KR;

Wook Rae Kim, Suwon-si, KR;

Kwang Soo Kim, Osan-si, KR;

Myung Jun Lee, Seongnam-si, KR;

Seo Yeon Jeong, Yongin-si, KR;

Sung Ho Jang, Yongin-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 9/02055 (2022.01); G01B 9/02 (2022.01); G01B 9/02001 (2022.01); G01B 9/02015 (2022.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
G01B 9/02063 (2013.01); G01B 9/02011 (2013.01); G01B 9/0203 (2013.01); G01B 9/02083 (2013.01); G01B 2290/70 (2013.01); H01L 22/12 (2013.01);
Abstract

A optical measurement apparatus includes: an optical system which generates a pupil image of a measurement target, using light; a polarization generator which generates a polarized light from the light; a self-interference generator which generates a plurality of beams divided from the pupil image, using the polarized light, and causes the plurality of beams to interfere with each other to generate a self-interference image; and an image analysis unit configured to extract phase data from the self-interference image, and to move the measurement target to a focus position on the basis of the phase data.


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