The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 28, 2025
Filed:
May. 20, 2022
Semes Co., Ltd., Cheonan-si, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Jaeseong Lee, Hwaseong-si, KR;
Kihoon Choi, Cheonan-si, KR;
Hae-Won Choi, Daejeon, KR;
Jihoon Jeong, Seongnam-si, KR;
Seohyun Kim, Hwaseong-si, KR;
Young-Hoo Kim, Yongin-si, KR;
Sangjine Park, Suwon-si, KR;
Kuntack Lee, Suwon-si, KR;
Semes Co., Ltd., Cheonan-si, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
A substrate processing apparatus includes a chamber including an upper chamber and a lower chamber coupled to each other to provide a space for processing a substrate, a substrate support configured to support the substrate within the chamber, an upper supply port provided in the upper chamber and configured to supply a supercritical fluid on an upper surface of the substrate within the chamber, a recess provided in a lower surface of the upper chamber, the recess including a horizontal extension portion extending in a direction parallel with the upper surface of the substrate in a radial direction from an outlet of the upper supply port and an inclined extension portion extending obliquely at an angle from the horizontal extension portion, and a baffle member disposed within the recess between the upper supply port and the substrate.